Posted on 2010-12-11. By anonymous.
Publisher: McGraw-Hill | pages: 500 | 2005 | ISBN: 0071445633 | PDF | 5,3 mb
Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure toolâ€™s source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics.
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