Photomask Fabrication Technology (Repost)

ISBN: 0071445633

Category: Technical

Tag: Science/Engineering

Posted on 2010-12-11. By anonymous.


Photomask Fabrication Technology
Publisher: McGraw-Hill | pages: 500 | 2005 | ISBN: 0071445633 | PDF | 5,3 mb

Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool’s source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics.

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